4-82-725
23.85
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[5]. J H Kim, et al. Characteristic corrosion resistance of nanocrystalline TiN films prepared by high density plasma reactive magnetron sputtering. J Nanosci Nanotechnol. 23 Jul;3(7):46-7.
H22-H39-H336
P2-P26-P264-P27-P28-P34+P34-P377-P38-P43-P45-P5
GHS2,GHS7
4.
378
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